Please use this identifier to cite or link to this item:
https://idr.l2.nitk.ac.in/jspui/handle/123456789/8037| Title: | Fabrication and characterization of ZnO/AI/ZnO multilayers by simultaneous DC and RF magnetron sputtering |
| Authors: | Nagaraja, K.K. Kumar, A.S. Nagaraja, H.S. |
| Issue Date: | 2015 |
| Citation: | IOP Conference Series: Materials Science and Engineering, 2015, Vol.73, 1, pp.- |
| Abstract: | The present investigation reports the fabrication and characterization of multilayered transparent electrodes by simultaneous DC and RF magnetron sputtering on glass substrates. The multilayer structure consists of three layers (ZnO/Al/ZnO). The influence of Al layer thickness on the electrical and optical properties was investigated. Optimum thickness of Al was determined for high transmittance and good electrical conductivity. High quality films having resistance as low as 25 ?/sq with optical transmittance upto 65% were obtained at room temperature. � Published under licence by IOP Publishing Ltd. |
| URI: | http://idr.nitk.ac.in/jspui/handle/123456789/8037 |
| Appears in Collections: | 2. Conference Papers |
Files in This Item:
There are no files associated with this item.
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.