1. IR@NITK
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  3. 7. Patents Published
Please use this identifier to cite or link to this item: https://idr.l2.nitk.ac.in/jspui/handle/123456789/16975
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dc.contributor.authorNational Institute of Technology Karnataka-
dc.date.accessioned2022-01-19T11:15:43Z-
dc.date.available2022-01-19T11:15:43Z-
dc.date.issued2021-05-28-
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/16975-
dc.descriptionPatent Published Date: 28.05.2021en_US
dc.language.isoenen_US
dc.publisherIndian Patent Office, Chennaien_US
dc.relation.ispartofseries201941047909;-
dc.subjectCOMPOSITIONen_US
dc.subjectFABRICATINGen_US
dc.subjectHIGH-K DIELECTRIC MATERIALen_US
dc.titleMETHOD AND COMPOSITION FOR FABRICATING A HIGH-K DIELECTRIC MATERIALen_US
dc.typeOtheren_US
Appears in Collections:7. Patents Published

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