Please use this identifier to cite or link to this item: https://idr.l2.nitk.ac.in/jspui/handle/123456789/16129
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dc.contributor.authorPrajwal K.
dc.contributor.authorPriyanka G.L.
dc.contributor.authorHasan M.A.
dc.contributor.authorCarmel Mary Esther A.
dc.contributor.authorSridhara N.
dc.contributor.authorRajendra A.
dc.contributor.authorArya S.B.
dc.contributor.authorDey A.
dc.date.accessioned2021-05-05T10:29:50Z-
dc.date.available2021-05-05T10:29:50Z-
dc.date.issued2021
dc.identifier.citationSurface Engineering , Vol. 37 , 3 , p. 400 - 405en_US
dc.identifier.urihttps://doi.org/10.1080/02670844.2020.1781376
dc.identifier.urihttp://idr.nitk.ac.in/jspui/handle/123456789/16129-
dc.description.abstractDC magnetron co-sputtering technique is utilised to develop reflective Ag- and Al-based metal films co-sputtered with Ni deposited on quartz glass substrates. The sputtered films are characterised by field emission scanning electron microscopy (FESEM), atomic force microscopy (AFM) and X-ray diffraction (XRD) techniques to investigate microstructure, topology and phase analysis, respectively. Further, average thermo-optical properties such as solar reflectance, absorptance and IR emittance and electrical property such as sheet resistance of the deposited films are evaluated. The reflectance property as a function of wavelength is also investigated. Sputtered Ag and Al films show high (>93%) reflectance, however, co-sputtered Al + Ni and Ag + Ni offer comparatively lesser value, e.g. 45% and 73%, respectively. The significant lower reflectance of Al + Ni is possibly due to the presence of higher amount of Ni in the film and the formation of intermetallic compounds. © 2020 Institute of Materials, Minerals and Mining Published by Taylor & Francis on behalf of the Institute.en_US
dc.titleDevelopment of reflective co-sputtered nanostructured metallic filmsen_US
dc.typeArticleen_US
Appears in Collections:1. Journal Articles

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